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Retricted access

Research article

First published 1982-7

In Situ Analysis of Fluorinated Gases in Plasma Etching by Infrared Spectroscopy

H. U. Poll, D. Hinze, H. Schlemm

Applied Spectroscopy

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Research article

First published 2004-12

Modelling plasma etching of AI thin films using neural network

B. Kim, K. Y. Park, D. Han

Surface Engineering

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Research article

First published 1999-1

Investigation into the Analytical Utility of Plasma Etching in Reactive Glow Discharge Plasmas

C. M. Barshick, K. R. Hess, A. L. Zook [...]

Applied Spectroscopy

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Research article

First published 2004-10

Pressure Controlled Surface Roughness of SiC Plasma Etching

B. Kim, B.-T. Lee

Surface Engineering

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Research article

First published 1989-11

The Application of ICP Spectroscopy to Model the Chemistry Occurring in Plasma-Etch Reactors: Part I

Karl E. Mautz, Michael L. Parsons, Carleton B. Moore

Applied Spectroscopy

Open access

Research article

First published 2018-1

Surface modification and fatigue properties of electrical discharge machined aluminum alloy 6061 using plasma etching

Chin-Guo Kuo, Chun-Yao Hsu, Jung-Hsuan Chen [...]

Advances in Mechanical Engineering

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Research article

First published 1980-1

Optical Spectroscopy Applied to the Study of Plasma Etching

R. G. Frieser, J. Nogay

Applied Spectroscopy

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Research article

First published 2004-2

Plasma Etch Prediction Using Genetic Algorithm Based Polynomial Neural Network

D.-W. Kim, B. Kim, I.-J. Shim [...]

Surface Engineering

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Research article

First published 1977-5

A Study of the Optical Emission from an rf Plasma during Semiconductor Etching

W. R. Harshbarger, R. A. Porter, T. A. Miller [...]

Applied Spectroscopy

Retricted access

Research article

First published 2016-1

Plasma nitriding of AISI 2205 steel: effects of surface mechanical attrition treatment and chemical etching

Atul M. Gatey, Santosh S. Hosmani, Shashi B. Arya [...]

Surface Engineering

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