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Articles (95)

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1-10 of 95 results for REACTIVE SPUTTER DEPOSITION

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Select article: Method to design stoichiometric deposition reactive sputtering without hysteresis

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Research article

First published 2013-8

Method to design stoichiometric deposition reactive sputtering without hysteresis

S Faddeeva, J Oseguera

Surface Engineering

Select article: Influence of processing parameters on deposition rate and crystal structure of reactively sputtered HfC

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Research article

First published 2007-5

Influence of processing parameters on deposition rate and crystal structure of reactively sputtered HfC

F. Z. Mohammad, K. J. Lawson, J. R. Nicholls

Surface Engineering

Select article: Reactive close field unbalance magnetron sputter deposition of titanium dioxides for potential photovoltaic applications

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Research article

First published 2017-8

Reactive close field unbalance magnetron sputter deposition of titanium dioxides for potential photovoltaic applications

Z. Zhang, G. Shao

Surface Engineering

Select article: Influence of Bias Voltage on Copper Nitride Films Deposited by Reactive Sputtering

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Research article

First published 2003-2

Influence of Bias Voltage on Copper Nitride Films Deposited by Reactive Sputtering

J. F. Pierson

Surface Engineering

Select article: Structural,mechanical and corrosion properties of NbN films deposited using dc and pulsed dc reactive magnetron sputtering

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Research article

First published 2010-11

Structural,mechanical and corrosion properties of NbN films deposited using dc and pulsed dc reactive magnetron sputtering

E. Arslan

Surface Engineering

Select article: Microstructure and properties of nc-TiC/a-C∶H films deposited by radio frequency reactive sputtering

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Research article

First published 2011-11

Microstructure and properties of nc-TiC/a-C∶H films deposited by radio frequency reactive sputtering

X Q Liu, J Yang, J Y Hao [...]

Materials Science and Technology

Select article: Hysteresis,structural and composition characteristics of deposited thin films by reactively sputtered titanium target in Ar/CH 4 /N 2 gas mixture

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Research article

First published 2013-8

Hysteresis,structural and composition characteristics of deposited thin films by reactively sputtered titanium target in Ar/CH 4 /N 2 gas mixture

O A Fouad, B Ali, S I Shah

Materials Science and Technology

Select article: Effects of nitrogen partial pressure on microstructure,morphology and N/Ti ratio of TiN films deposited by reactive magnetron sputtering

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Research article

First published 2007-8

Effects of nitrogen partial pressure on microstructure,morphology and N/Ti ratio of TiN films deposited by reactive magnetron sputtering

K. Yang, J. Q. Jiang, M. Y. Gu

Materials Science and Technology

Select article: Influence of nitrogen flow rate on growth of TiAlN films prepared by DC magnetron sputtering

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Research article

First published 2007-1

Influence of nitrogen flow rate on growth of TiAlN films prepared by DC magnetron sputtering

A. A. Irudayaraj, P. Kuppusami, R. Thirumurugesan [...]

Surface Engineering

Select article: Effects of Deposition Parameters on Structure and Composition of Reactively Sputtered TiN x Films

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Research article

First published 1987-1

Effects of Deposition Parameters on Structure and Composition of Reactively Sputtered TiN x Films

R. Manory

Surface Engineering

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