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Abstract

The effects of different deposition parameters on the composition and crystallographic features of radio frequency magnetron sputtered TiN_x films were studied. A ‘phase relation diagram’ correlating film composition and ratio of input power to nitrogen flow is proposed. The partial pressure of nitrogen has been found not to be of importance in determining either the cOlnposition or the orientation of the films. The effects of N₂/Ar ratio, nitrogen flow, and total reactor pressure are shown. A linear decrease in lattice paran1eter with increasing target to specimen distance was found. This may serve as a good means of controlling film composition within the range of the gold colour (0.8 ≤ x ≤ 1). The optimum deposition conditions for hard films were determined.

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MATTHEWS

and SUNDQUIST

H. A.

: Proc. Int. Ion Engineering Congr., ‘ISIAT ‘83’, 1325; 1983, Kyoto, Institute of Electrical Engineers (Japan).

MATTHEWS

and LEFKOW

A. R.

: Thin Solid Films, 1985, 126, 283.

SPROUL

w. D.

: Thin Solid Films, 1983, 107, 143; 1984, 118, 279.

KODAMA

and BUNSHAH

R. F.

: Thin Solid Films, 1982, 96, 53.

MONZ

W. D.

and HESSBERGER

: Ind. Res. Dev., Sept. 1981, 130.

WITTMER

: J. Vac. Sci. Technol., 1985, A3, 1797.

MANORY

and GRILL

: Plating Surf Finish., 1986, 73, 68; NASA TM-87152, National Aeronautics and Space Adminis-tration, Cleveland, OH, 1985.

CHEVALLIER

, CHABERT

J. P.

, and SPITZ

: Proc. Int. Conf. IPAT ’81, Amsterdam, 1981, CEP Consultants; Comptes Rendus DMG 21/81, Centre d'Etude Nucleaire, Grenoble, 1981.

AVNI

and SPALVINS

: NASA TM-83798, National Aeronautics and Space Administration, Cleveland, OH, 1984.

10.

LEMPERIERE

and POINTEVIN

J. M.

: Thin Solid Films, 1984, 111, 339.

11.

MU§IL

, VY§KOCIL

, and LONNA

: Proc. 7th Int. Symp. on ‘Plasma chemistry’, (ed. Timmermans

C. J.

), 62; 1985, Eindhoven, Eindhoven University of Technology.

12.

MANORY

: J. Vac. Sci. Technol., 1986, A4, 2392.

13.

PERRY

A. J.

: Thin Solid Films, 1985, 123, 223.

14.

HULTMAN

, HENZELL

H. T. G.

, SUNDGREN

J. E.

, JOHNSSON

B.-O.

, and HELMERSSON

: Thin Solid Films, 1985, 124, 163.

15.

ABE

and YAMISHINA

: Thin Solid Films, 1975, 30, 19.

16.

THORNTON

: Proc. 20th Ann. Tech. Conf. Soc. Vacuum Coaters, Atlanta, GA, 1977, American Society of Vacuum Coaters, 5–14.

17.

HOHNKE

D. K.

, SCHMATSZ

D. J.

, and HURLEY

M. D.

: Thin Solid Films, 1984, 118, 301.

18.

SUNDGREN

J. E.

: Thin Solid Films, 1985, 128, 21.

19.

MANORY

and KIMMEL

: Thin Solid Films, 1987, in press.

20.

YEE

D. S.

, CUOMO

J. J.

, FRISCH

M. A.

, and SMITH

D. P. E.

: J. Vac. Sci. Technol., 1986, A4, 381.

21.

JOHANSSON

B.-co.

, HENZELL

H. T. G.

, HARPER

J. M. E.

, and CUOMO

J. J.

: J. Mater. Res., 1986, 1, 442.

22.

TOTH

L. E.

: ‘Transition metal carbides and nitrides’, chap. 2, 87–88; 1971, London, New York, Academic Press.

23.

MOLARIUS

J. M.

, KORHONEN

A. S.

, and RISTOLAINEN

E. O.

: J. Vac. Sci. Technol., 1985, A3, 2419.

24.

MANORY

: J. Electrochem. Soc., 1986, 133, 1752.

25.

BERG

, LARSSON

, and BLOEM

H. O.

: J. Vac. Sci. Technol., 1986, A4, 594.

26.

NAGAKURA

, KUSUNOKI

, KAMIMOTO

, and HIROTSU

: J. App!. Crystallogr., 1975, 8, 65.

27.

PERRY

A. J.

and CHOLLET

: J. Vac. Sci. Technol., 1986, A4, 2801.

28.

MANORY

: in preparation.

Effects of Deposition Parameters on Structure and Composition of Reactively Sputtered TiN x Films

Abstract

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References