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Research article

First published 2011-1

Preparation and Properties of Four-component Copolymers Applied in Negative-type Photoresists

H.-Y. Huang, H Chen, M.-Y. Hsu

Journal of Thermoplastic Composite Materials

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Research article

First published 2006-4

A Very Low-Cost System for Photoresist Coating of Microwave Substrate Boards for Educational Purposes

E. Márquez-Segura, P. Otero, C. Camacho-Peñalosa [...]

International Journal of Electrical Engineering & Education

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Research article

First published 2008-1

Thick photoresists for electroforming metallic microcomponents

X Wei, C-H Lee, Z Jiang [...]

Proceedings of the Institution of Mechanical Engineers,Part C: Journal of Mechanical Engineering Science

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Research article

First published 1970-7

An investigation of photoresists for use in optical strain analysis

A Luxmoore, R Hermann

The Journal of Strain Analysis for Engineering Design

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Research article

First published 2001-03

Novel Crosslinking Method for Negative Tone Photoresist having Pendant Carboxyl Moieties

Jui-Hsiang Liu, Jen-Chieh Shih

High Performance Polymers

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Research article

First published 2007-08

Photocuring Reaction of Poly(Glycidyl Methacrylate-Co-N,N'-Dimethyl Acrylamide) using Photogenerated Amine from Bis(4-Formyl Aminophenyl ) Methane for Photoresist Applications

Abdel-Ghaffar El-Demerdash

High Performance Polymers

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Research article

First published 1976-9

Spectroscopic Study of Radiofrequency Oxygen Plasma Stripping of Negative Photoresists. I. Ultraviolet Spectrum

E. O. Degenkolb, C. J. Mogab, M. R. Goldrick [...]

Applied Spectroscopy

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Research article

First published 2026-2

Nanomechanical properties of SU8-photoresist thin films

Braj Krishna, Rajneesh Kumar Singh, Yadvendra Kumar Mishra

Journal of Elastomers & Plastics

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Research article

First published 1995-08

Water-developable photoresists employing onium salt photoinitiators

Keith Davidson, Philip C Hadley

High Performance Polymers

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Research article

First published 1992-7

ATR/IR Spectroscopic Method for following Photo-Polymer Curing

Randy W. Snyder, Stephen J. Fuerniss

Applied Spectroscopy

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