Surface structure and electrical properties of Ag based low emissivity film by vacuum magnetron sputtering

Abstract

Ag based low emissivity film was deposited on glass by vacuum magnetron sputtering and then post-treated in the glass tempering tempering furnace at 650–700°C for 4, 5 and 6 min respectively. The structural and electrical properties have been investigated as a function of post-treatment time. The results show that with increasing heated time, the structure of the film gradually crystallises and Ag₂O (111) appears. The resistivity and sheet resistance have a sharp increase from as deposited to heat treated films and then decrease with increasing time. The calculated emissivity is 0·16 for the as deposited film, increases to 0·39 heated for 4 min and decreases to 0·14 heated for 6 min.