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Abstract

Direct information about initial thermal evolution behaviour of the platelet defects in hydrogen implanted silicon wafers is retained in annealed samples as thin as transmission electron microscopic (TEM) foil and can then be observed using high resolution transmission electron microscopy (HRTEM). It has been found that platelet-like amorphous inclusion appears in the initial stage of the thermal evolution and, additionally, thermal evolution preferentially occurs around the defects of the comparatively larger sized platelets, the reasons for which are discussed. By using the channelling implantation method, the characteristic platelet size distribution was acquired and the crack position was further modified.

Keywords

SILICON HYDROGEN ION IMPLANTATION PLATELET DEFECT THERMAL EVOLUTION HRTEM

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Direct determination of the initial thermal evolution behaviour of the platelet defects in hydrogen implanted silicon wafers

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