Yaw error correction of ultra-precision stage for scanning beam interference lithography systems

Abstract

The stage yaw error is a key factor affecting the phase distortion of gratings produced by scanning beam interference lithography system. In order to solve this problem, a coarse-fine dual-stage mechanism is proposed, in which an ultra-precision fine positioning stage with yaw error correction function is developed. To achieve nanoscale positioning and sub-microradian yaw motion accuracy, four Lorentz motors are used to drive the fine stage. The internal coupling factors and the mechanism of Lorentz motors motion control are analyzed. Besides, the Abbe error caused by the yaw error is investigated. Positioning and scanning experiments are conducted and the outcomes show that maximum yaw error is 0.33 μrad during constant velocity scanning, which completely meets the grating fabrication requirements.

Keywords

Scanning beam interference lithography fine positioning stage Lorentz motors position-dependency coupling Abbe error

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