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Research article

First published 2009-3

An accurate and efficient control over the present numerical model of depth of sputtering in focused ion beam milling

S N Bhavsar, S Aravindan, P Venkateswara Rao

Proceedings of the Institution of Mechanical Engineers,Part N: Journal of Nanomaterials,Nanoengineering and Nanosystems

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Research article

First published 2004-6

Industrial Application of Pulsed Dc Bias Power Supplies in Closed Field Unbalanced Magnetron Sputter Ion Plating

K.E. Cooke, J. Hampshire, W. Southall [...]

Surface Engineering

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Research article

First published 1992-7

Ion–surface interactions: From sputtering to reactive ion etching

C. Steinbruchel

Materials Science and Technology

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Research article

First published 1994-08

The Effects of Ion Sputtering on Dentin and its Relation to Depth Profiling

R.G. Miller, C.Q. Bowles, P.L. Gutshall [...]

Journal of Dental Research

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Research article

First published 2008-5

Electromechanical properties of nichrome (80/20 wt-%) thin film fabricated by low energy ion sputtering

J. W. Yan, J. C. Zhou, C. S. Zhang [...]

Surface Engineering

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Research article

First published 1976-9

Emission Spectrographic Analysis of Surfaces with an Ion-Sputtering Source

M. E. Waitlevertch, J. K. Hurwitz

Applied Spectroscopy

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Research article

First published 1972-5

X-Ray Photoelectron Spectroscopic Studies of Valence States Produced by Ion-Sputtering Reduction

Lo I Yin, Subrata Ghose, Isidore Adler

Applied Spectroscopy

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Research article

First published 2007-7

Effects of ion beam voltage on properties of indium tin oxide films prepared by ion beam sputtering

D.-F. Lii, J.-L. Huang, I.-J. Jen [...]

Surface Engineering

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Research article

First published 1996-6

Recipe Control for Closed-Field Unbalanced Magnetron Sputter Ion-Plating Machines

A P Roskilly, M I Barlow

Proceedings of the Institution of Mechanical Engineers,Part E: Journal of Process Mechanical Engineering

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Research article

First published 2007-9

Microstructure and electrical properties of Ni–Cr thin films fabricated by ion beam sputtering

J. C. Zhou, L. Tian, J. W. Yan

Materials Science and Technology

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