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Abstract

The electromechanical properties of nichrome (Ni–Cr 80/20 wt-%) used as a common material for application in thin film strain gauges have been studied. The composition and oxidation of Ni–Cr film fabricated by low energy ion beam sputtering has been studied by Auger electron spectroscopy. The microstructure of the film was determined by a TEM. The temperature coefficient of resistance has been determined by a Nanovolt/Microohm meter. The gauge factor has been determined by the cantilever method. Low stable temperature coefficient of resistance values of resistance stability and the desired sheet resistance have been obtained. It meets the main demanded properties for its application to strain sensitive film.

Keywords

LOW ENERGY ION BEAM SPUTTERING NI-CR THIN FILM THERMAL ANNEALING TCR GAUGE FACTOR

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Electromechanical properties of nichrome (80/20 wt-%) thin film fabricated by low energy ion sputtering

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References