Low temperature Fourier transform infrared measurements at 20 K on some wafers containing substitutional atomic carbon and oxygen are presented. Spectral subtraction techniques at 20 K indicate an increase of approximately 5 times in sensitivity compared to the room temperature evaluation of the carbon and oxygen concentrations.
ASTM F123–74, unpublished revision to the standard test method for substitutional atomic carbon content of single crystal silicon by infrared absorption, (ASTM Committee F1, 1979).
6.
German Standard DIN 50 438, Parts 1 and 2.
7.
German Standard FNM-A9, 22–74, unpublished revised edition for evaluation of oxygen content of silicon by infrared absorption.
8.
GraffK.GrallathE.AdesS.GoldbachG., and TolgG., Solid-State Electron.16, 887 (1973).
