Abstract
Abstract
CrN/TaN nanoscale multilayered thin films with a lamination of hard transition metal nitrides were deposited by closed field unbalanced magnetron sputtering (CFUBMS). The bilayer period (λ) of all of the laminated layers was controlled within the range from 4.3 to 43 nm. The CrN/TaN nanoscale multilayered thin films exhibited a (200) preferred orientation. The mechanical properties of the thin films, as determined by nano-indentation testing, showed a dependence on various bilayer periods (λ). The multilayer with a bilayer period of 5.4 nm exhibited high hardness, high resistance to plastic deformation, and high wear resistance.
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