Abstract
By controlling the sputtering power, rotational speed of substrate and sputtering time, Ni–Cr thin films with appropriate composition were fabricated by double target magnetron cosputtering techniques. The homogeneity and oxidation of Ni–Cr film has been studied by Auger electron spectroscopy. The structures of films were determined by an X-ray diffractometer and a transmission electron microscope respectively. Gauge factor (GF) has been determined by the cantilever method. The relations between GF, temperature coefficient of resistance and compositions of films were discussed. The dependence of resistivity and Cr concentration in Ni–Cr thin film follows an exponential function. The optimal resistance stability of nanoscale Ni–Cr thin film is achieved by a rapid thermal process combined with a conventional thermal annealing technique. As a strain sensitive material, Ni–Cr thin films with optimal composition, desire GF and reliable electrical properties have been attained.
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