Three-dimensional nanoimprint lithography using photocurable resins

Abstract

Three-dimensional nanoimprint lithography was carried out using a photocurable resin. First, a fabricated nanoimprint lithography mould was coated with an antisticking layer. Then, an ultraviolet photocurable resin was dispensed onto cleaned glass slides or poly(ethylene terephthalate) films. The mould was pressed against the resin on the substrate, and the impressed photocurable resin was exposed to ultraviolet radiation. The mould was then removed, leaving a replica of its pattern. Using a three-dimensional mould with a very rough surface, it was possible to evaluate the photocurable resins, and it was found that the use of monomers with weaker intermolecular forces improved the transfer and release properties.