Abstract
Fully dense anatase and rutile (TiO2) films were coated on (0001) α-quartz wafers using ultrasonic spray pyrolysis in air at 400°C for 2 h. The TiO2 films were annealed subsequently in air for 4 h at 600, 800 and 1000°C respectively. The films were characterised using X-ray diffraction (mineralogy), ultraviolet visible spectrophotometry (optical properties) and photoluminescence (structural defects). These data are interpreted in terms of phase transformation temperature, optical mean free path, refractive index and effect of heat treatment on the concentration of oxygen vacancies and/or silicon contamination.
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