Facile fabrication of ultraviolet-protective silk fabrics via atomic layer deposition of TiO 2 with subsequent polyvinylsilsesquioxane modification

Abstract

To develop ultraviolet (UV) light-protective silk fabrics (SFs), a conformal nanoscale TiO₂ coating was deposited using an atomic layer deposition (ALD) method, and polyvinylsilsesquioxanes (PVSs) were further coated onto the SFs to enhance their hydrophobicity and UV light-resistance. Scanning electron microscopy and atomic force microscopy revealed hierarchical microstructures and nanostructures of the TiO₂ coatings, which were primarily responsible for the increase of the water contact angle from approximately 0 to 120° after the ALD process. A high mean square surface roughness of 76.325 nm also accounted for this improved water contact angle. Furthermore, TiO₂-coated SFs modified with low surface energy PVSs exhibited enhanced hydrophobic properties. More importantly, both the UV-blocking and yellowing-resistance of the SFs were improved without any significant change to the luster of the SFs. The ease and simplicity of this fabrication method makes it applicable to the preparation of multifunctional textiles with both good water repellency and UV-resistance.