High-temperature hydrogenation behaviour of bulk titanium silicon carbide

Abstract

Thermal stability of Ti₃SiC₂ was investigated at 1200–1400°C in hydrogen atmosphere for 3 hours. The hydrogenation mechanism was clarified by a combination of X-ray diffraction, scanning electron microscope, Raman spectroscopy and first principles calculation. At 1200°C, a dense and uniform TiSi₂ layer formed on the sample surface, which originated from both the preferable lose of silicon from the Ti₃SiC₂ substrate and the dissociation of Ti₃SiC₂. As temperature increased to 1300°C, TiSi₂ layer began to scale off and presented laminated Ti₃SiC₂ grains beneath this layer, which indicated preferential hydrogenation occurred along the basal planes. This phenomenon was ascribed to the fact that the introduction of H interstitial atom weakened the combination between titanium and silicon interface layer, which was confirmed by first principles calculations. In addition, the formation of TiSi₂ owing to the dissociation of Ti₃SiC₂ caused the volume expansion after hydrogenation, resulting in that majority of TiSi₂ layer spelled off at 1400°C.