This article deals with an investigation of the effect of oxygen content on optical and structural properties of ZnO films. Zinc oxide films were deposited with the DC reactive magnetron sputtering process on Si(100) and glass substrates. ZnO films were elaborated at different oxygen flow rates from (O2) 12 to 35 sccm. The evolution of optical and structural properties as a function of O2 was investigated by X-ray diffraction, Profilometer, Field Emission Scanning Electron Microscopy (FESEM) and ultraviolet–visible. By increasing O2, the crystallite size increases from 20 to 27 nm, which leads to an enlargement in the ZnO band gap from 3.18 to 3.30 eV. At 30 sccm of O2, the films present a significant improvement in the band gap (3.30 eV). The results reveal that with increasing O2, all films show a high crystallinity in the wurtzite phase and present a (002)ZnO preferential orientation along the c-axis. ZnO exhibited a good self-texture.
RahmanA, JayaganthanR.Study of nanostructured Co and Al Co-doped ZnO films fabricated by electroless technique. Surf Eng. 2016;31:372–377. doi: 10.1179/1743294415Y.0000000079
3.
RavichandranK, SindhujaE, UmaR, Photocatalytic efficacy of ZnO films – light intensity and thickness effects. Surf Eng. 2017;33:512–520. doi: 10.1080/02670844.2016.1270797
4.
AmuthasurabiM, ChandradassJ, Seong-JuP, Reduction of self-heating effect in (Ga)ZnO thin film transistor. Surf Eng. 2018;34:816–819.
5.
ManivasahamA, RavichandranK, SubhaK.Light intensity effects on the sensitivity of ZnO:Cr gas sensor. Surf Eng. 2017;33:866–876. doi: 10.1080/02670844.2017.1331724
ThomasD, VattappalamSC, MathewS, Studies on effect of oxygen flow rate in textured grain growth of ZnO thin films. Mater Sci Eng. 2015;73:1–5.
8.
ThomasD, VattappalamSC, MathewS, Studies on effect of oxygen flow rate in textured grain growth of ZnO thin films. Mater Sci Eng. 2015;73:1–5.
9.
KasugaM, MochizukiM.Orientation relationships of zinc oxide on sapphire in heteroepitaxial chemical vapor deposition. J Cryst Growth. 1981;54:185–194. doi: 10.1016/0022-0248(81)90459-0
10.
SameemMS.Effect of substrates and film thickness on the properties of ZnO thin films grown by chemical bath deposition. Int J Res Sci Eng Technol. 2015;II:19.
11.
AmuthasurabiM, ChandradassJ, Seong-JuP, Reduction of self-heating effect in (Ga)ZnO thin film transistor. Surf Eng. 2017;33:816–819. doi: 10.1080/02670844.2017.1294813
12.
VinothE, GowrishankarS, GopalakrishnanN.RF magnetron sputtered Cd doped ZnO thin films for gas-sensing applications. Mater Manuf Process. 2017;32:377–382. doi: 10.1080/10426914.2016.1244834
13.
CaoPJ, HanS, LiuWJ, Effect of oxygen flow rate on optical and electrical properties in Al doped ZnO thin films. Mater Technol Adv Perfor Mater. 2014;29 (6):1753–5557.
14.
JungYS, SeoaJY, LeeDW, . Influence of DC magnetron sputtering parameters on the properties of amorphous indium zinc oxide thin film. Thin Solid Films. 2003;445(6):63–71. doi: 10.1016/j.tsf.2003.09.014
15.
AissaniL, NouveauC, WalockMJ, Influence of vanadium on structure, mechanical and tribological properties of CrN coatings. Surf Eng. 2015;31:779–788. doi: 10.1179/1743294415Y.0000000043
16.
AissaniL, FellahM, NouveauC, Structural and mechanical properties of Cr–Zr–N coatings with different Zr content. Surf Eng. 2017;33:1743–2944.
17.
ZhuHua, WangHemei, WanWenqiong.Influence of oxygen and argon flow on properties of aluminum-doped zinc oxide thin films prepared by magnetron sputtering. Thin Solid Films. 2014;566:32–37. http://dx.doi.org/10.1016/j.tsf.2014.07.021
18.
ZhuH, WangH, WanW, Influence of oxygen and argon flow on properties of aluminum-doped zinc oxide thin films prepared by magnetron sputtering. Thin Solid Film. 2014;566:32–37. doi: 10.1016/j.tsf.2014.07.021
19.
SilvaPS, EdinéiaP, SchmitzS, Electrodeposition of Zn and Zn–Mn alloy coatings from an electrolytic bath prepared by recovery of exhausted zinc–carbon batteries. J Power Sources. 2012;210:161–121. doi: 10.1016/j.jpowsour.2012.03.021
20.
HeHY, ShenQ.Template effects of microstructure and property of sol–gel-deposited ZnO:Al:Mo films. Mater Manuf Process. 2014;29:1157–1161. doi: 10.1080/10426914.2013.840914
FujimuraN, NishiharaT, GotoS, Control of preferred orientation for ZnOx films: control of self-texture. J Crystal Growth. 1992;130:269–279. doi:10.1016/0022-0248(93)90861-P
23.
TaucJ.Amorphous and liquid semiconductor. London
: Plenum Press; 1974.
24.
SamiyammalP, ParasuramanK, PrabhaD, Optical and magnetic properties of Ba-doped CdS thin films. Surf Eng. 2017;33:835–840. doi: 10.1080/02670844.2017.1303981
25.
DuttaV.Spray deposited ZnO nanostructured layers for dye sensitized solar cells. Energy Procedia. 2011;3:58–62. doi.org/10.1016/j.egypro.2011.01.010
26.
BediaaA, Bediaa FZFZ, Aillerieb MM, Morphological and Optical properties of ZnO thin films prepared by spray pyrolysis on glass substrates at various temperatures for integration in solar cell.Eng Procedia. 2015;74:529–538. doi: 10.1016/j.egypro.2015.07.740
27.
ZhangX, MaS, LiuF, Effects of substrate temperature on the growth orientation and optical properties of ZnO:Fe films synthesized via magnetron sputtering. J Alloys Compd. 2013;574:149–154. doi: 10.1016/j.jallcom.2013.04.055
28.
LiuH, ZengF, LinY, Correlation of the oxygen vacancy variations to the band gap changes in epitaxial. Appl Phys Lett. 2013;102:181908. doi: 10.1063/1.4804613
