A modified electron beam evaporator has been used to synthesise TiN thin films with (111) preferred orientation. This new design involved in creating local plasma by accelerating the secondary electrons emitted from the evaporating ingot by a positively biased semi-cylindrical anode plate (biased activated reactive evaporation). To accelerate the reaction to form TiN, a jet of
gas has been focused towards the substrate as a reactive gas. We have observed a preferred orientation (111) with
to the surface normal in pole figure analysis. The residual stress by the classical sin
technique did not yield any tangible result due to the preferred orientation. The hardness and modulus measured by nanoindentation technique was around 19.5 and 214 GPa. The continuous multicycle indentation test on these films exhibited a stress relaxation.
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gas has been focused towards the substrate as a reactive gas. We have observed a preferred orientation (111) with
to the surface normal in pole figure analysis. The residual stress by the classical sin
technique did not yield any tangible result due to the preferred orientation. The hardness and modulus measured by nanoindentation technique was around 19.5 and 214 GPa. The continuous multicycle indentation test on these films exhibited a stress relaxation.