This study explores the influence of process parameters on the structural, mechanical, and electrical properties of ZrAlNiCu alloy and nitride film obtained by magnetron sputtering of a single Zr51Al11Ni4Cu34 target. Selected variables affecting the process are working pressure, substrate temperature, and nitrogen partial pressure. Almost all films are amorphous except for nitride films deposited at moderate nitrogen partial pressure, which consist of the FCC-ZrN nanophase. A low working pressure and high substrate temperature result in refined boundary interfaces, thus increasing their hardness and electrical conductivity. Nitride films have higher hardness and lower electrical conductivity than alloy films because of their strong ionic metal-N bonding. Thus, the formation of FCC-ZrN nanocrystals is conducive to the further improvement of hardness.
SubramanianBMaruthamuthuSRajanST.Biocompatibility evaluation of sputtered zirconium-based thin film metallic glass-coated steels. Int J Nanomed. 2015;10:17–29.
12.
YiuPDiyatmikaWBönninghoffNThin film metallic glasses: properties, applications and future. J Appl Phys. 2020;127:030901.
13.
KubeSASohnSOjeda-MotaRCompositional dependence of the fragility in metallic glass forming liquids. Nat Commun. 2022;13:3708.
14.
ChoHKimHYMiyazakiS.Fabrication and characterization of Ti–Ni shape memory thin film using Ti/Ni multilayer technique. Sci Technol Adv Mater. 2005;6:678–683.
15.
RaufAGuoCYFangYNBinary Cu-Zr thin film metallic glasses with tunable nanoscale structures and properties. J Non-Cryst Solids. 2018;498:95–102.
16.
RaufAFangYZhangHThickness effects on microstructure, mechanical and soft magnetic properties of sputtered FeZr thin film metallic glass. J Non-Cryst Solids. 2019;521:119500.
17.
MarimuthuKPHanGLeeH.Effect of modulation ratio on the mechanical behavior of multilayer-thin-film metallic glasses. J Mater Res Technol. 2022;16:216–228.
18.
LeeJHuangK-HHsuK-CApplying composition control to improve the mechanical and thermal properties of Zr–Cu–Ni–Al thin film metallic glass by magnetron DC sputtering. Surf Coat Technol. 2015;278:132–137.
19.
LeeJTungH-CDuhJ-G.Enhancement of mechanical and thermal properties in Zr–Cu–Ni–Al–N thin film metallic glass by compositional control of nitrogen. Mater Lett. 2015;159:369–372.
20.
ChuJ-HChenH-WChanY-CModification of structure and property in Zr-based thin film metallic glass via processing temperature control. Thin Solid Films. 2014;561:38–42.
21.
SharmaPZhangWAmiyaKNanoscale patterning of Zr-Al-Cu-Ni metallic glass thin films deposited by magnetron sputtering. J Nanosci Nanotechnol. 2005;5:416–420.
22.
JeongUHanJMarimuthuKPEvaluation of mechanical properties of Zr–Cu–Al–Ni TFMG using nanoindentation. J Mater Res Technol. 2021;12:2368–2382.
23.
SongHOhSYoonHBifunctional NiFe inverse opal electrocatalysts with heterojunction Si solar cells for 9.54%-efficient unassisted solar water splitting. Nano Energy. 2017;42:1–7.
24.
TsaiD-CChangZ-CKuoB-HWide variation in the structure and physical properties of reactively sputtered (TiZrHf)N coatings under different working pressures. J Alloys Compd. 2018;750:350–359.
25.
KoenigTRRaoZChasonEThe microstructural and stress evolution in sputter deposited Ni thin films. Surf Coat Technol. 2021;412:126973.
AdjaoudOAlbeK.Microstructure formation of metallic nanoglasses: insights from molecular dynamics simulations. Acta Mater. 2018;145:322–330.
28.
AdibiSBranicioPSZhangY-WComposition and grain size effects on the structural and mechanical properties of CuZr nanoglasses. J Appl Phys. 2014;116:043522.
29.
AdibiSShaZ-DBranicioPSA transition from localized shear banding to homogeneous superplastic flow in nanoglass. Appl Phys Lett. 2013;103:211905.
30.
BrognaraABestJPDjemiaPEffect of composition and nanostructure on the mechanical properties and thermal stability of Zr100-xCux thin film metallic glasses. Mater Des. 2022;219:110752.
31.
GuJSongMNiSEffects of annealing on the hardness and elastic modulus of a Cu36Zr48Al8Ag8 bulk metallic glass. Mater Des. 2013;47:706–710.
32.
KhamsehSNoseMKawabataTInfluence of total gas pressure on the microstructure and properties of CrAlN films deposited by a pulsed DC balanced magnetron sputtering system. J Alloys Compd. 2010;503:389–391.
33.
GuoYMaDLiXEffects of room temperature rolling in different directions on magnetic properties, electrical properties and bending ductility of Fe85P11C2B2 amorphous alloy. J Non-Cryst Solids. 2022;596:121875.
34.
KimBGSongJSKimHSMagnetic properties of very high permeability, low coercivity, and high electrical resistivity in Fe87Zr7B5Ag1 amorphous alloy. J Appl Phys. 1995;77:5298–5302.
35.
ChanK-YTeoB-S.Sputtering power and deposition pressure effects on the electrical and structural properties of copper thin films. J Mater Sci. 2005;40:5971–5981.
36.
ChuJPKuoC-HLoC-T. Annealing-induced extensive solid-state amorphization in metallic films, US20080128055A1, 2008.
BignoliFRashidSRossiEEffect of annealing on mechanical properties and thermal stability of ZrCu/O nanocomposite amorphous films synthetized by pulsed laser deposition. Mater Des. 2022;221:110972.
39.
MittererCMayrhoferPHMusilJ.Thermal stability of PVD hard coatings. Vacuum. 2003;71:279–284.
40.
ChaudhariP.Grain growth and stress relief in thin films. J Vac Sci Technol. 1972;9:520–522.
41.
HuGKongXWangYFormation mechanism of amorphous layer at the interface of Si(111) substrate and AlN buffer layer for GaN. J Mater Sci Lett. 2003;22:1581–1583.
42.
IvanisenkoYKübelCNandamSHStructure and properties of nanoglasses. Adv Eng Mater. 2018;20:1800404.
43.
LiedtkeD.Wärmebehandlung von Eisenwerkstoffen II. 7th ed.Tübingen, Germany: Expert-Verlag; 2018.
44.
TsaiD-CChenE-CChangZ-CEffect of nitrogen partial pressure on the structural, mechanical, and electrical properties of (CrHfNbTaTiVZr)N coatings deposited by reactive magnetron sputtering. Coatings. 2022;12:437.
45.
HultmanLSundgrenJ-EGreeneJE.Formation of polyhedral N2 bubbles during reactive sputter deposition of epitaxial TiN(100) films. J Appl Phys. 1989;66:536–544.
46.
MahieuSGhekierePDe WinterGBiaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering. Surf Coat Technol. 2006;200:2764–2768.
47.
GreeneJESundgrenJ-EHultmanLDevelopment of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputtering. Appl Phys Lett. 1995;67:2928–2930.
48.
DrüsedauTPBläsingJ.Optical and structural properties of highly c-axis oriented aluminum nitride prepared by sputter-deposition in pure nitrogen. Thin Solid Films. 2000;377:27–31.
49.
KwonJ-SParkC-HChoiJ-WPreparation and characterization of the sputtered TiAlN coatings using a Ti–Al alloy metal target. J Nanosci Nanotechnol. 2019;19:6493–6498.
50.
MüllerMH.Monte Carlo calculation for structural modifications in ion-assisted thin film deposition due to thermal spikes. J Vac Sci Technol A. 1986;4:184–188.
51.
SiegelRWFougereGE.Mechanical properties of nanophase metals. Nanostruct Mater. 1995;6:205–216.
52.
OnufrievSVSavvatimskiyAIMuboyadzhyanSA.Investigation of physical properties of 0.9ZrN + 0.1ZrO2 ceramics at 2000–4500 K by current pulse heating. Mater Res Express. 2020;6:125554.
53.
ChungCKChenTS.Effect of nitrogen flow ratios on the microstructure and properties of Ta–Al–N thin films by reactive cosputtering. J Electrochem Soc. 2008;156:H119.
54.
PeartonSJ.Ion implantation for isolation of III-V semiconductors. Mater Sci Rep. 1990;4:313–363.
