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Research article

First published 2007-5

Influence of processing parameters on deposition rate and crystal structure of reactively sputtered HfC

F. Z. Mohammad, K. J. Lawson, J. R. Nicholls

Surface Engineering

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Research article

First published 2017-8

Reactive close field unbalance magnetron sputter deposition of titanium dioxides for potential photovoltaic applications

Z. Zhang, G. Shao

Surface Engineering

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Research article

First published 2017-12

Fabrication of nanostructured silicon nitride thin film gas sensors by reactive direct current magnetron sputtering

Firas J Kadhim, Ahmed A Anber

Proceedings of the Institution of Mechanical Engineers,Part N: Journal of Nanomaterials,Nanoengineering and Nanosystems

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Research article

First published 2012-10

Thermodynamic model of reactive sputtering process

S Faddeeva, J Oseguera

Surface Engineering

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Research article

First published 2017-8

Silicon nitride nanostructures prepared by reactive sputtering using closed-field unbalanced dual magnetrons

Oday A Hammadi, Mohammad K Khalaf, Firas J Kadhim

Proceedings of the Institution of Mechanical Engineers,Part L: Journal of Materials: Design and Applications

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Research article

First published 2013-8

Method to design stoichiometric deposition reactive sputtering without hysteresis

S Faddeeva, J Oseguera

Surface Engineering

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Research article

First published 2007-8

Effects of nitrogen partial pressure on microstructure,morphology and N/Ti ratio of TiN films deposited by reactive magnetron sputtering

K. Yang, J. Q. Jiang, M. Y. Gu

Materials Science and Technology

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Research article

First published 1992-7

Ion–surface interactions: From sputtering to reactive ion etching

C. Steinbruchel

Materials Science and Technology

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Research article

First published 2004-6

Time Resolved Langmuir Probe Characterisation of Reactive Pulse Magnetron Sputtering of MgO Thin Films

F. Richter, T. Welzel, T. Dunger [...]

Surface Engineering

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Research article

First published 2010-11

Structural,mechanical and corrosion properties of NbN films deposited using dc and pulsed dc reactive magnetron sputtering

E. Arslan

Surface Engineering

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