Search results: Sage Journals

Restricted accessResearch articleFirst published December, 2008

Pressure Broadening of H 2 O Absorption Lines in the 1.3 μm Region Measured by Continuous Wave-Cavity Ring-Down Spectroscopy: Application in the Trace Detection of Water Vapor in N 2,SiH 4,CF 4,and PH 3

Phyllis A. Y. Fiadzomor, Derek M. Baker, Anthony M. Keen [...]

Applied Spectroscopy

Restricted accessResearch articleFirst published September, 1995

Toxicological Investigations in the Semiconductor Industry: IV: Studies On the Subchronic Oral Toxicity and Genotoxicity of Vacuum Pump Oils Contaminated By Waste Products From Aluminum Plasma Etching Processes

Siegfried Bauer, Ilona Wolff, Nadeshda Werner [...]

Toxicology and Industrial Health

Restricted accessResearch articleFirst published July, 1985

Semiconductor gas sensors

P. T. Moseley, B. C. Tofield

Materials Science and Technology

Restricted accessResearch articleFirst published January, 1997

Surface modification by plasma ion and ion beam implantation

I. F. Husein, Y. Zhou, S. Qin [...]

Surface Engineering

Restricted accessResearch articleFirst published November, 1992

Toxicological Investigations in the Semiconductor Industry: II. Studies on the Subacute Inhalation Toxicity and Genotoxicity of Gaseous Waste Products from the Aluminium Plasma Etching Process

Siegfried Bauer, Nadeshda Werner, Ilona Wolff [...]

Toxicology and Industrial Health

Restricted accessResearch articleFirst published May, 1977

A Study of the Optical Emission from an rf Plasma during Semiconductor Etching

W. R. Harshbarger, R. A. Porter, T. A. Miller [...]

Applied Spectroscopy

Restricted accessResearch articleFirst published December 22, 2021

CO and NO selective adsorption by a C 16 Mg 8 O 8 nanocage: A DFT Study

Shaghayegh Ariaei, Hossein Sakhaeinia, Amir Heydarinasab [...]

Main Group Chemistry

Restricted accessResearch articleFirst published May, 1992

Toxicological Investigations in the Semiconductor Industry: I. Studies on the Acute Oral Toxicity of a Complex Mixture of Waste Products from the Aluminium Plasma Etching Process

Siegfried Bauer, Ilona Wolff, Nadeshda Werner [...]

Toxicology and Industrial Health

Free accessResearch articleFirst published May, 1999

Studies of the Adsorption of SO 2,H 2 and O 2 on a Cr 2 O 3 Surface by an Electrical Conductivity Technique

Mahmoud M. Khader, Mahmoud M. Saleh, Ahmad M. Mohammad

Adsorption Science & Technology

Restricted accessResearch articleFirst published April, 2007

Detection of Trace Water Vapor in High-Purity Phosphine Using Cavity Ring-Down Spectroscopy

Hans H. Funke, Mark W. Raynor, Kris A. Bertness [...]

Applied Spectroscopy

Restricted accessResearch articleFirst published December, 2008

Pressure Broadening of H 2 O Absorption Lines in the 1.3 μm Region Measured by Continuous Wave-Cavity Ring-Down Spectroscopy: Application in the Trace Detection of Water Vapor in N 2,SiH 4,CF 4,and PH 3

Phyllis A. Y. Fiadzomor, Derek M. Baker, Anthony M. Keen [...]

Applied Spectroscopy

Restricted accessResearch articleFirst published September, 1995

Toxicological Investigations in the Semiconductor Industry: IV: Studies On the Subchronic Oral Toxicity and Genotoxicity of Vacuum Pump Oils Contaminated By Waste Products From Aluminum Plasma Etching Processes

Siegfried Bauer, Ilona Wolff, Nadeshda Werner [...]

Toxicology and Industrial Health

Restricted accessResearch articleFirst published July, 1985

Semiconductor gas sensors

P. T. Moseley, B. C. Tofield

Materials Science and Technology

Restricted accessResearch articleFirst published January, 1997

Surface modification by plasma ion and ion beam implantation

I. F. Husein, Y. Zhou, S. Qin [...]

Surface Engineering

Restricted accessResearch articleFirst published November, 1992

Toxicological Investigations in the Semiconductor Industry: II. Studies on the Subacute Inhalation Toxicity and Genotoxicity of Gaseous Waste Products from the Aluminium Plasma Etching Process

Siegfried Bauer, Nadeshda Werner, Ilona Wolff [...]

Toxicology and Industrial Health

Restricted accessResearch articleFirst published May, 1977

A Study of the Optical Emission from an rf Plasma during Semiconductor Etching

W. R. Harshbarger, R. A. Porter, T. A. Miller [...]

Applied Spectroscopy

Restricted accessResearch articleFirst published December 22, 2021

CO and NO selective adsorption by a C 16 Mg 8 O 8 nanocage: A DFT Study

Shaghayegh Ariaei, Hossein Sakhaeinia, Amir Heydarinasab [...]

Main Group Chemistry

Restricted accessResearch articleFirst published May, 1992

Toxicological Investigations in the Semiconductor Industry: I. Studies on the Acute Oral Toxicity of a Complex Mixture of Waste Products from the Aluminium Plasma Etching Process

Siegfried Bauer, Ilona Wolff, Nadeshda Werner [...]

Toxicology and Industrial Health

Free accessResearch articleFirst published May, 1999

Studies of the Adsorption of SO 2,H 2 and O 2 on a Cr 2 O 3 Surface by an Electrical Conductivity Technique

Mahmoud M. Khader, Mahmoud M. Saleh, Ahmad M. Mohammad

Adsorption Science & Technology

Restricted accessResearch articleFirst published April, 2007

Detection of Trace Water Vapor in High-Purity Phosphine Using Cavity Ring-Down Spectroscopy

Hans H. Funke, Mark W. Raynor, Kris A. Bertness [...]

Applied Spectroscopy