Toxicological Investigations in the Semiconductor Industry: IV: Studies On the Subchronic Oral Toxicity and Genotoxicity of Vacuum Pump Oils Contaminated By Waste Products From Aluminum Plasma Etching Processes

Abstract

Dry etching processes in semiconductor manufacturing use ionized gases in closed reactors at pressures below 1 torr. Vacuum pump systems that service the reaction chambers are potential sources of exposure to complex mixtures of

Keywords

AMW average molecular weights b.w.body weight Ca++calcium DMSO dimethyl sulfoxide ERY erythrocyte GC/MS gas chromatography/mass spectroscopy Hb hemoglobin HCB hexachlorobenzene HK hematocrit ICP-AES inductively coupled plasma-atomic emission spectroscopy ICP-MS inductively coupled plasma-mass spectroscopy i.p.intraperitoneal K+potassium LEU leukocyte LYM lymphocytes MPCEs micronucleated polychromatic erythrocytes Na+sodium OECD Organization for Economic Cooperation and Development PCEs polychromatic erythrocytes PFPE perfluoropolyethers RER rough endoplasmic reticulum SE standard error SEG segmented neutrophils.

Get full access to this article

View all access options for this article.

References

Ames, B.N. , McCann, J. , and Yamasaky, E. (1975). "Methods for determining carcinogens and mutagens with the Salmonella/mammalian-microsome mutagenicity test." Mutat. Res. 31:347-364.

Anonymous (1994). Pentachloropyridine, safety data sheet. Sigma-Aldrich GmbH, Deisenhofen, Germany .

Baldwin, D.G. , Bruce, W.K. , and Scarpace, L.P. (1988). "Ion implanters: Chemical and radiation safety." Solid State Technol. 31:99-105.

Bauer, S. , Wolff, I. , Werner, N. , Hoffmann, P. , Hillig, R. , Voigt, R. , Merten, B. , Oemus, K. , and Rath, F.-W. (1991). "Toxicological investigations of waste products from the plasma etching process in the semiconductor industry." Arch. Toxicol. Suppl. 14:303-306.

Bauer, S. , Wolff, I. , Werner, N. , and Hoffmann, P. (1992a). "Health hazards in the semiconductor industry." Polish J. Occup. Med. Environ. Health 5:299-314.

Bauer, S. , Wolff, I. , Werner, N. , Hoffmann, P. , Herzschuh, R. , Oemus, K. , Rath, F.-W. , and Voigt, R. (1992b). "Toxicological investigations in the semiconductor industry: I. Studies on the acute oral toxicity of a complex mixture of waste products from the aluminium plasma etching process." Toxicol. Ind. Health 8:141-156.

Bauer, S. , Werner, N. , Wolff, I. , Damme, B. , Oemus, K. , and Hoffmann, P. (1992c). "Toxicological investigations in the semiconductor industry: II. Studies on the subacute inhalation toxicity and genotoxicity of gaseous waste products from the aluminium plasma etching process." Toxicol. Ind. Health 8:431-444.

Bauer, S. , Wolff, I. , Schmidt, R. , Pelzing, M. , and Herzschuh, R. (1994). Waste Products from Plasma Etching Processes - Results of a Complex Analytical and Toxicological Study. Proceedings of the "Environmental and Safety Conference IV," September, San Jose, CA.

Birkenfeld, T. (1990). Analytical Investigations of Organic Residues from Plasma Etching with Chlorine-Containing Reactants. Dissertation A, Dept. of Chemistry, KMU Leipzig, Germany . In German.

10.

CLAYTON, G.D. and CLAYTON, F.E. (eds.) (1982). Patty's Industrial Hygiene and Toxicology. 3rd ed. John Wiley and Sons, New York.

11.

Herb, G.K. , Caffrey, R.E. , Eckroth, E.T. , Jarrett, Q.T. , Fraust, C.L. , and Fulton, J.A. (1983). "Plasma processing: Some safety health and engineering considerations." Solid State Technol. 26:185-193.

12.

Kier, L.E. , Brusick, D.J. , Auletta,A.E. , Von Halle, E.S. , Brown, M.M. , Simmon, V.F. , Dunkel, V. , M, J. , Mortelmans, K. , Prival, M. , Rao, T.K. , and Ray, V. (1986). "The Salmonella typhimurium/mammalian microsomal assay. A report of the U.S. Environmental Protection Agency Gene-Tox Program." Mutat. Res. 168:69-240.

13.

Ladou, J. (1993). "Health issues in the global semiconductor industry." OEM REPORT. Occup. Environ. Med. Report 7:27-32.

14.

Macgregor, J.T. , Wehr, C.M. , Henika, P.R. , and Shelby, D. (1990). "The in vivo erythrocyte micronucleus test: Measurement at steady state increases assay efficiency and permits integration with toxicity studies." Fundam. Appl. Toxicol. 14:513-522.

15.

Maron, D.M. and Ames, B.N. (1983). "Revised methods for the Salmonella mutagenicity test." Mutat. Res. 113:173-215.

16.

Mersch-Sundermann, V. , Dickgiesser, N. , Kotter, K. , and Harre, M. (1988). "The mutagenicity of surface water, waste water and drinking water in the Rhein-Neckar-Region with the Salmonella/microsome test (Ames test)." Zentralblatt Bakt. Mikrobiolog. Hyg. 185:397-410.

17.

Mueller, M.R. and Kunesh, R.F. (1989). "Safety and health implications of dry chemical etching." In: Hazard Assessment and Control Technology in Semiconductor Manufacturing. Lewis Publishers, Inc., Chelsea, MI. pp. 179-201.

18.

Neudecker, T. and Henschler, D. (1986). "Mutagenicity of chloroolefins in the Salmonella/mammalian microsome test: III. Metabolic activation of the allylic chloropropenes allyl chloride, 1,3-dichloropropene, 2,2-dichloro-1-propene, 1,2,3-trichloropropene, 1,1,2,3-tetrachloro-2-propene and hexachloropropene by S9 mix via two different metabolic pathways." Mutat. Res. 170:1-9.

19.

Ohlson, J. (1986). "Dry etch chemical safety." Solid State Technol. 29:69-73.

20.

Pastides, H. , Calabrese, E.J. , Hosmer, D.W. , and Harris, D.H. (1988). "Spontaneous abortion and general illness symptoms among semiconductor manufacturers." J. Occup. Med. 30:543-551.

21.

Roos, G. (1992). "Occupational medicine risk assessment of plasma etching processes including the characterization of genotoxicological risks." 1992 Annual Meeting of the Society of German Company Physicians, Regensburg, Germany. pp. 137-147.

22.

Ruuskanen, J. , Que Hee, S.S. , Ayer, H. , Boyle, J.R. , Webster, S. , Jbara, J. , Mantei, T.D. , and Willeke, K. (1990). "Contamination in an experimental gallium arsenide etch system." Am. Ind. Hyg. Assoc. J. 51:8-13.

23.

Schenker, M. (1992). Epidemiologic Study of Reproductive and Other Health Effects among Workers Employed in the Manufacture of Semiconductors - Final Report to the Semiconductor Industry Association. SIA and Univ. of Calif. at Davis, CA, December.

24.

Schmidt, R. , Scheufler, H. , Bauer, S. , Wolff, I. , Pelzing, M. , and Herzschuh, R. (1995). "Toxicological investigations in the semiconductor industry: III. Studies on prenatal toxicity caused by waste products from aluminium plasma etching processes." Toxicol. Ind. Health 11(2)49-61.

25.

Schmidt, W. (1976). "The micronucleus test for cytogenetic analysis." In: Chemical Mutagens (A. Hollaender, ed.). Vol. 4. Plenum, New York. pp. 31-53.

26.

Simon, G.S. , Kipps, B.R. , Tardiff, R.G. , and Borzelleca, J.F. (1978). "Failure of kepone and hexachlorobenzene to induce dominant lethal mutations in the rat." Toxicol. Appl. Pharmacol. 45:330-331.

27.

Strang, C.R. and Levine, S.P. (1987). "Preliminary investigation of the contamination of semiconductor process pump oil by halogenated organic compounds." Solid State Technol. 30:69-70.

28.

Woodfin, V.L. (1978). "Poly(perfluoropropylene oxide) as a reference standard for mass measurement to mass 2000." Anal. Chem. 50:1228-1229.