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Scanning beam interference lithography
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Select article: Yaw error correction of ultra-precision stage for scanning beam interference lithography systems
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Research article
First published August, 2018
Yaw error correction of ultra-precision stage for scanning beam interference lithography systems
Sen Lu,
Kaiming Yang,
Yu Zhu
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Proceedings of the Institution of Mechanical Engineers,Part I: Journal of Systems and Control Engineering
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Select article: Study of a Chemically Amplified Resist for X-Ray Lithography by Fourier Transform Infrared Spectroscopy
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Research article
First published November, 2004
Study of a Chemically Amplified Resist for X-Ray Lithography by Fourier Transform Infrared Spectroscopy
T. L. Tan,
D. Wong,
P. Lee
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Applied Spectroscopy
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