Effectiveness of using a magnetic compound fluid with a pulsed magnetic field for flat surface polishing

Abstract

The effects of the frequency of a pulsed magnetic field on flat polishing were investigated to obtain basic data for increasing the performance and precision of polishing using MCFs. We clarified that the profile curves after polishing differ for a direct-current magnetic field and for a pulsed magnetic field and flattening occurred over a wide range when the frequency of a pulsed magnetic field is 0.1 Hz.