Abstract
We experimentally investigated the relation of shear stress to shear rate of improved magnetic compound fluid (MCF) in engineering applications such as dampers and micro-polishing. The newly improved MCF is composed of smectite particles in a MCF previously developed by Shimada. In the new MCF, the particle distribution is more stable and the particles do not sediment. In the context micro-polishing, the relation of shear stress to shear rate in the newly improved MCF containing abrasive particles was investigated. The addition of the abrasive or smectite particles makes the shear stress change little in regard to changes in shear rate. Thus, the newly improved MCF can be applied to the micro-polishing of material surfaces at existing shear rates.
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