Free-surface dynamics in the Ribbon Growth on Substrate (RGS) process

Abstract

With the Ribbon Growth on Substrate (RGS) technology, a new crystallization technique is available that allows controlled high crystallization rate production of silicon wafers and advanced metal-silicide alloys. Compared to other casting methods, such as e.g. directional solidification, the RGS process allows better crystallization control, high volume manufacturing and high material yield due to its continuous, substrate-driven design. Insights from modelling the characteristic melt flow in the casting frame are very desirable. To address this demand, we are developing a new numerical tool based on OpenFOAM [1] which can be utilized to simulate the free-surface dynamics of the melt flow under the influence of alternating electromagnetic fields. The underlying multi-physical model involves three-dimensional hydrodynamic and magnetodynamic effects and their interaction.