Abstract
Characterization of nanometer-order organic contaminants on polymer film and silicon wafer surface has been investigated by a modified IR–Johnson method. We have proposed a silver film-enhanced IR–Johnson method that is useful for surface contaminant analysis. In the present method, organic traces are transferred from the surface of a polymer film or silicon wafer onto the KBr particles deposited with silver film, and then the KBr particles are analyzed directly by diffuse reflectance infrared Fourier transform spectroscopy (DRIFTS). Infrared absorption of organic traces was enhanced by the presence of silver island film. With this method, a spectrum of nanometer-order organic traces can be obtained without any interference from the polymer film substrate. The present method is as surface-sensitive as X-ray photoelectron spectroscopy (XPS) and provides a large amount of information on the chemical structure of surface contaminants. This is a promising method for the surface characterization of polymer films and silicon wafer. Index Headings: Infrared; Diffuse reflectance; Surface enhancement.
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