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Abstract

Electron spectroscopy for chemical analysis (ESCA) is used to study selected regions of a brass surface subjected to gas-jet-enhanced sputtering in a glow discharge. Gas jets directed at the sample surface during sputtering in a glow discharge increase the removal rate of sample material from the surface and cause changes to the surface which are visually evident in the formation of craters and surface deposits. Changes in chemical composition of these regions are observed when successive atomic layers are removed from the sample by the ion beam etching accessory in the ESCA spectrometer. The effects of ion bombardment can be explained in terms of the selective sputtering of one bulk component over another. The surfaces in the sputtered craters were found to be depleted of the higher-sputtering-yield component, Zn, when compared to the bulk composition. In a deposit, the component with the highest sputtering yield was found to be more concentrated in layers closest to the bulk material. The component with the lowest sputtering yield was found at relatively higher concentrations nearest the deposit surface. The component with the higher sputtering yield is selectively sputtered first during the glow discharge, and consequently is deposited with a higher concentration closest to the bulk, the converse being true for the lowest-sputtering-yield component.

Keywords

Glow discharge ESCA Selective sputtering Surface deposits Gas jets

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References

Bruhn

C. G.

and Harrison

W. W

, Anal. Chem. 50, 16 (1978).

Kim

H. J.

and Piepmeier

E. H

, Anal. Chem. 60, 2040 (1988).

Seah

M. P.

, Thin Solid Films 81, 279 (1981).

Laegreid

and Wehner

G. K

, J. Appl. Phys. 32, 365 (1961).

Schirrwitz

, Contrib. to Plasma Phys. 2, 188 (1962).

Oechsner

, Appl. Phys. 8, 185 (1975).

Kelly

, Nucl. Instr. and Methods 149, 553 (1978).

Daughtrey

E. H.

Jr. Donohue

D. L.

Slevin

P. J.

and Harrison

W. W

, Anal. Chem. 47, 683 (1975).

Fang

and Marcus

R. K

, J. Anal. Atomic Spectrosc. 3, 875 (1988).

10.

Wagatsuma

and Hirokawa

, Surf. Interface Anal. 6, 167 (1984).

11.

Holm

and Storp

, Physica Scripta 16, 442 (1977).

12.

Stoch

and Ladecka

, Appl. Surface Science 31, 426 (1988).

13.

Anjali

Salvi

V. P.

Gogawale

S. V.

Kulkarni

S. K.

and Gokhale

, Vacuum 43, 1197 (1992).

14.

Hofmann

, in Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy, Briggs

and Seah

M. P

, Eds. (John Wiley and Sons, New York, 1987), Chap. 4.

15.

Briggs

and Riviere

J. C

, in Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy, Briggs

and Seah

M. P

, Eds. (John Wiley and Sons, New York, 1987), Chap. 3.

16.

Powell

C. J.

, “The Physical Basis for Quantitative Analysis by Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy,” in Quantitative Surface Analysis of Materials, American Society for Testing and Materials Special Technical Publication 643, McIntyre

N. S.

, Ed. (ASTM, Philadelphia, 1978).

17.

Schofield

J. H.

, J. Elect. Spec. and Related Phenom. 8, 129 (1976).

18.

Tanuma

Powell

C. J.

and Penn

D. R

, Surf. and Interface Anal. 17, 911 (1991).

19.

Shimizu

Ono

and Nakayama

, Surf. Sci. 36, 817 (1973).

ESCA Studies of a Brass Surface Subjected to Gas-Jet-Enhanced Sputtering in a Glow Discharge

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