Abstract
Titanium aluminium nitride films were deposited on a plasma nitrided high speed steel substrate by reactive sputtering. The hardness and nitriding depth of the plasma nitrided substrates increased with increase in N2/(N2 + H2) flow ratio because of the enhanced diffusion of nitrogen atoms. The hardness and adhesive strength of TiAlN films coated on the plasma nitrided substrate were also found to be higher than those of the unnitrided substrates. In addition, the hardness of the TiAlN films increased with increase in the N2 + H2) flow ratio. The wear resistance, which was principally dominated by the hardness of the TiAlN films, was also enhanced by an increase in theN2/(N2 + H2) flow ratio.
Get full access to this article
View all access options for this article.
