Abstract
Electrodeposition is widely used to deposit a variety of metals and alloys. Although high rates can be achievedusing this technique, there is limited control over the microstructure of the deposits and in many instances the use of toxic precursors and disposal of toxic effluents has to be considered. This has spurred the development of alternative deposition processes. The Jet Vapor Deposition™ (JVD™) process is a rapidly emerging ‘green’ technology which allows control of microstructure at high deposition rates. A brief discussionof the principles of JVD and representative applications in the deposition of metals (such as copper and gold) and alloys (Cu–Ag and Ag–Sn) are presented.
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