Sputter deposited W–C–Co films with different thicknesses were prepared on substrates that had been given various hardening treatments. After physical and chelnical characterisation, the hardness of the films was evaluated by applying a model to the experimental hardness data obtained by micro indentation equipment. Good results for the hardness were obtained for all the film thicknesses and substrate hardnesses investigated. However, if the substrate hardness was less than 600 HV, the calculated hardness for the fibns decreasedwith decreasing substrate hardness.
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