A plasma assisted CVD technique for fabrication of optical planar waveguides on silica substrates is described. Silica films doped with germania have been deposited at 1000-1100°C with <0.3 dB cm-1 attenuation, sharp refractive index profiles, and satisfactory adhesion and integrity. Deposition has been achieved at temperatures down to 100°C, but resultant film attenuation, adhesion, and integrity are substantially inferior. Codeposition of fluorine is shown to improve the mechanical properties, while cladding and buffer layers are expected to enhance the optical performance of the waveguides.
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References
1.
DENP. K.: Rev. Mol. Phys., 1977, 49, (2), 361.
2.
CHANGW. S. C., MULLERM. W., and ROSENBAUMF. J.: ‘Integrated Optics’; 1974, New York, Academic.
3.
SARASWATK. C. and MOHAMMADIF.: IEEE Trans., 1982, ED-29, (4), 645.
4.
GOODMANJ. W., LEONBERGERF. I., KUNGS., and ATHALER. A.: IEE Proc., 1984, 72, (7), 850
5.
CUNDYS. L., EVANSR. A., McCORMACKJ. S., NICHOLSD. A., JOHNSONO. S., and McCANNK.(GEC): ‘Radial and annular plasma deposition’, UK Patent 8204914, February1982.
6.
SARKERA.: Fiber and Integr. Opt., 1985, 5, (2), 135.
7.
LAWNB. R., EVANSA. G., and MARSHALLD. B.: J. Am. Ceram. Soc., 1980, 63, 574.
8.
EVANSA. G. and HUTCHINSONJ. W.: Int. J. Solids Struct., 1984, 20, 455.
9.
KANDASAMYI. and GAWNED. T.: J. Phys. D, Appl. Phys., 1988, 21, S75.
10.
KANDASAMYI. and GAWNED. T.: unpublished work.
11.
ULRICHR. and TORGER.: Appl. Opt., 1973, 12, 2901.
12.
NOURSHARGHN., STARRE. M., FOXN. I., and JONESS. G.: Electron. Lett., 1985, 21, 818.
13.
BACHMANNP., GEITTNERP., and WILSONH.: Proc. European Conf. on ‘Optical communications’, 1982, Paper C22, Cannes, France.
14.
NOURSHARGHN., STARRE. M., and McCORMACKJ. S.: IEE Proc., 1988, 133, (4), 264.
