A series of experiments for optimising titanium nitride films deposited on various substrates is described. The target to specimen distance was found to affect the deposition rate, the lattice parameter, and the microhardness of the films. The surface preparation was found to affect the form of the X-ray diffractograms obtained from the films. Optimisation of the films was based on maximum microhardness and not on maximum deposition rates. Microhardness values of (111) oriented films deposited on different substrates after such an optimisation exceeded 3300 HV(3g). The friction coefficient of these hard films against diamond was found to be in the range 0.06-0.14.
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