Abstract
It is shown that secondary recrystallization and development of the (110) [001] texture in 3¼% silicon-iron strip can be obtained by control of the oxygen content of the hydrogen sintering atmosphere. The conditions required are described.
The sintered compact is then cold rolled according to a schedule used for rolling grain-oriented silicon-iron from a cast ingot.
It is found that the temperature of secondary recrystallization is higher than that for conventionally made strip.
It is suggested that a critical amount of silicon is oxidized to silica during sintering and that this silica acts as a dispersed phase in the inhibition-dependent mechanism known to be responsible for secondary recrystallization.
In an appendix, an account is given of a short X-ray method for checking the texture of the silicon-iron strip.
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