Abstract
In recent years, several technologies that modify implant surfaces have been emerged. Among these techniques, the plasma nitriding process has been successfully applied in biomedical field. Nevertheless, its use in dental implants is quite limited owing to the high temperatures of the process (between 700 and 800°C), which causes distortion. In order to solve this problem, a new approach is proposed in the present paper, by which nitriding under a hollow cathode discharge is used to modify surfaces. Grade II Ti plates were submitted to nitriding under hollow cathode discharge conditions and treated at a temperature 450°C and pressure of 150 Pa for 1 h. These showed that plasma nitriding helped bring about a significant change in the surface texture of the treated plates. Furthermore, cell proliferation was 2⋅5 times as high as that of the untreated plates.
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