The effect of anodic polarisation on dissolution of copper in hydroxylamine based chemical systems has been studied using a quartz crystal microbalance technique to evaluate their use in electrochemical mechanical planarisation processes. Copper dissolution in hydroxylamine solution increases with respect to overpotential η and dissolution rates as high as 600 nm min–1 have been obtained at an overpotential of 750 mV. The effectiveness of benzotriazole (BTA) in inhibiting copper dissolution in these chemistries was also tested. It was found that BTA is effective in inhibiting copper dissolution only at lower overpotentials (≤250 mV).
KondoS.TominagaS.NamikiA.YamadaK.AbeD.FukayaK.ShimadaM. andKobayashiN.: ‘IEEE International Interconnect Technology Conference’, San Francisco, CA, IEEE6–8 June 2005203–205.
2.
EconomikosL.WangX.SakamotoA.OngP.NaujokM.KnarrR.ChenL.MoonY.NeoS.SalfeklerJ.DuboustA.ManensA.LuW.ShrautiS.LiuF.TsaiS. andSwartW.: ‘IEEE International Interconnect Technology Conference’, Burlingame, CA, IEEE7–9 June 2004233–235.
3.
LiuF. Q.ChenL.DuboustA.TsaiS.ManensA.WangY. and Y:W.Y.Mater. Res. Soc. Symp. Proc., 200586987–96.
4.
SuniI. I. and DuB.: IEEE Trans. Semicond. Manuf., 200518, (3), 341–349.
5.
HuangW.TamilmaniS.RaghavanS. and SmallR.: Int. J. Miner. Process., 200372365–372.
6.
GoonetillekeP. C. and RoyD.: Mater. Chem. Phys., 200594388–400.
7.
GoonetillekeP. C.BabuS. V. and RoyD.: Electrochem. Solid-State Lett., 20058, (8), G190—G193.
8.
HongY.RoyD. and BabuS. V.: Electrochem. Solid-State Lett., 20058, (11), G297—G300.
9.
TamilmaniS.: ‘Dissolution, corrosion and environmental issues in chemical mechanical planarisation of copper’PhD dissertationUniversity of Arizona, Tucson, AZ, USA2005.
10.
BastidasJ. M.PinillaP.PoloJ. L. and CanoE.: Corrosion200258, (11), 922–931.
11.
JohnsonD. A. and Y:F.Y.Proc. 8th Eur. Symp. on ‘Corrosion inhibitors ‘, Italy, Ferrara Vol. 10989–998; 1995.
12.
MansikkamaekiK.AhonenP.FabriciusG.MurtomakiL. and KontturiK.: J. Electrochem. Soc., 2005152, (1), B12—B16.
13.
BrusicV.FrischM. A.EldridgeB. N.NovakF. P.KaufmanF. B.RushB. M. and FrankelG. S.: J. Electrochem. Soc., 1991138, (8), 2253–2259.
