Abstract
Wafer curvature measurements are a simple yet sensitive way to measure stress in thin films. A multibeam optical system designed for in situ monitoring makes it possible to monitor the evolution of thin film stress in real time in a variety of deposition and processing environments. Examples of stress measurements in epitaxial systems, polycrystalline films and hard coatings are discussed.
Get full access to this article
View all access options for this article.
References
1.
STONEY
G. G.
:
Proc
. R. Soc. (London) A , 1909 , 82 , 172 .
2.
DOERNER
M. F.
and
NIX
W. D.
: Crit Rev. Solid State Mater. Scl , 1988 , 14 , 225 .
3.
FREUND
L. B.
and
SURESH
S.
‘Thin film materials’ ; 2003 , Cambridge , Cambridge University Press .
4.
FREUND
L. B.
,
FLORO
J. A.
CHASON
E.
: AppL Phys. Lett ., 1999 , 74 , 1987 .
5.
FLINN
P. A.
,
GARDNER
D. S.
NIX
W. D.
: IEEE Trans. Electron Devices , 1987 , 34 , 689 .
6.
PAN
J. T.
and
BLECH
I. J.
: J. AppL Phys ., 1984 , 55 , 2874 .
7.
SCHELL-SOROKIN
A.
and
TROMP
R.
: Phys. Rev. Lett ., 1990 , 64 , 1039 .
8.
MARTINEZ
R.
,
AUGUSTINIAK
A.
GOLOVCHENKO
J. A.
: Phys. Rev. Lett ., 1990 , 64 , 1035 .
9.
CHASON
E.
and
FLORO
J. A.
: Mater. Res. Soc. Symp. PrOC ., 1996 , 428 , 499 .
10.
KOCH
R.
,
LEONHARD
H.
,
THURNER
G.
ABERMANN
R.
: Rev. Sci. Instrum ., 1990 , 61 , 3859 .
11.
SANDER
D.
and
IBACH
H.
: Phys. Rev. B, Condens. Matter , 1991 , 43 , 4263 .
12.
SEGMULLER
A.
,
ANGILELLO
J.
LAPLACA
S. J.
: J. AppL Phys ., 1980 , 51 , 6224 .
13.
TAO
J.
,
LEE
L. H.
BILELLO
J. C.
: J. Electron. Mater ., 1991 , 20 , 819 .
14.
FLORO
J. A.
,
HEARNE
S. J.
,
HUNTER
J. A.
,
KOTULA
P.
,
CHASON
E.
,
SEEL
S. C.
THOMPSON
C. V.
: J. AppL Phys ., 2001 , 89 , 4886 .
15.
PHILLIPS
M. A.
,
RAMASWAMY
V.
,
CLEMENS
B. M.
NIX
W. D.
: J. Mater. Res ., 2000 , 15 , 2540 .
16.
FLORO
J. A.
and
CHASON
E.
: AppL Phys. Lett ., 1996 , 69 , 3830 .
17.
BERESFORD
R.
,
YIN
J.
,
TETZ
K.
CHASON
E.
: J. Vac. Sci. TechnoL B , 2000 , 18 , 1431 .
18.
HEARNE
S. J.
,
CHASON
E.
,
HAN
J.
,
FLORO
J. A.
,
FIGIEL
J.
,
HUNTER
J.
,
AMONO
H.
TSONG
I. S. T.
: AppL Phys. Lett ., 1999 , 74 , 356 .
19.
HEARNE
S. J.
: unpublished work.
20.
BERESFORD
R.
,
TETZ
K.
,
YIN
J.
,
CHASON
E.
GONZALEZ
M. U.
: J. Vac. Sci. TechnoL B , 2001 , 19 , 1572 .
21.
HOFFMAN
R. W.
: Thin Solid Films , 1976 , 34 , 185 .
22.
ABERMANN
R.
and
KOCH
R.
: Thin Solid Films , 1985 , 129 , 71 .
23.
ABERMANN
R.
: Vacuum , 1990 , 41 , 1279 .
24.
KOCH
R.
: J. Phys., Condens. Mater. , 1994 , 6 , 9519 .
25.
SHULL
A. L.
and
SPAEPEN
F.
: J. AppL Phys ., 1996 , 80 , 6243 .
26.
SHELDON
B. W.
,
LAU
K. H. A.
and
RAJAMANE
A.
J. AppL Phys ., 2001 , 90 , 5097 .
27.
NIX
W. D.
and
CLEMENS
B. M.
: J. Mater. Res :, 1999 , 14 , 3467 .
28.
FREUND
L. B.
and
CHASON
E.
: J. AppL Phys ., 2001 , 89 , 4866 .
29.
RAJAMANI
A.
,
SHELDON
B. W.
,
CHASON
E.
BOWER
A. F.
: AppL Phys. Lett ., 2002 , 81 , 1204 .
30.
CHASON
E.
,
SHELDON
B. W.
,
FREUND
L. B.
,
FLORO
J. A.
HEARNE
S. J.
: Phys. Rev. Lett ., 2002 , 88 , 156103 .
31.
RAMASWAMY
V.
: PhD thesis, Department of Materials Science and Engineering, Stanford University, 2000.
32.
PhD
A. RAJAMANE
thesis, Division of Engineering, Brown University, 2003.
33.
HEARNE
S. J.
,
HAN
J.
,
LEE
S. R.
,
FLORO
J. A.
,
FOLLSTAEDT
D. M.
,
CHASON
E.
and I. s.
TSONG
T.
AppL Phys. Lett ., 2000 , 76 , 1534 .