Quality and reliability in diamond deposition using CVD

Abstract

In the manufacturing industry, quality and reliability have become very important issues for both consumer and industrial products. These issues need be addressed in order for companies to remain competitive within the global marketplace. By way of illustration, a process known as chemical vapour deposition (CVD) is considered in this paper. This process is now widely used in industry to deposit a number of thin films for a diverse range of applications such as microelectronics, biomedical components, cutting tools, ophthalmic lenses, and decorative products. Polycrystalline diamond films have been selected to illustrate the importance of factors effecting the quality and reliability of films deposited. The effects of process parameters such as temperature, substrate properties, cleanliness, methane gas concentration, and adhesion are described. In addition, in order to achieve the maximum benefit from film quality and reliability, a ‘systems approach’ is discussed taking into consideration substrate pretreatments, deposition stages, and post-deposition treatments.