Hydrogen embrittlement of titanium during microwave plasma assisted CVD diamond deposition

Abstract

During diamond deposition on a titanium substrate using a gas mixture of H₂–CH₄ (196 : 4), hydrogen easily diffused into the substrate and led to significant microstructural coarsening and a severe loss in Charpy impact energy. In order to prevent the rapid diffusion of hydrogen into the substrate during diamond deposition, three techniques were studied. The first method was to use a post-vacuum annealing treatment to achieve dehydrogenation of a diamond coated titanium specimen. However, the Charpy impact energy could not be restored significantly even after a few hours of annealing. The second method was to apply a barrier interlayer between the diamond coating and titanium substrate. Results showed that even though the sputtered TiN coating and plasma nitrided layer could prevent the rapid diffusion of hydrogen and carbon into the titanium substrate, the deposited diamond coatings had poor adhesion to the substrate. A graded interlayer produced by plasma nitriding followed by plasma carbonitriding was effective in preventing the rapid diffusion of hydrogen and also improving the nucleation rate and adhesion of the diamond coating. The third method was to use a gas mixture of Ar–H₂–CH₄ instead of the conventional H₂–CH₄. With the use of an Ar–H₂–CH₄ (180 : 16 : 4) mixture, a smooth and nanocrystalline diamond coating was deposited, and there was little change in the substrate microstructure or Charpy impact energy after diamond deposition.