The dissolution behaviour of the anodic oxide film on zirconium was investigated in hydrochloric acid solutions of various concentrations. The dissolution process as indicated from capacitance measurements was, under all conditions, found tofollow the relation, 1/Cm = α–βt1/2, the values of the coefficients α and β being dependent on the test solutions. The barrierfilm on zirconium was found to be duplex in nature, the outer layer being more susceptible to dissolution than the inner one.
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