This article presents the properties of the micro–nano sacle laser patterning system based on digital micromirror device. The introduction of the excellent spatial light modulator—digital micromirror device—provides a possibility for the patterning system to combine high resolution and accuracy with short writing time. The optical characteristics of the digital micromirror device–input imaging system are analyzed. An overlapping exposure method is proposed to obtain optical resolution enhancement and high fidelity of the input pattern. Based on this method, an optical synthetic-aperture effect is realized without increasing the system complexity or decreasing the process efficiency.
