Polymer Materials for Microlithography - Electron Beam Resists

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Kitakohji T. , Yoneda Y. , Kitamura K. , Okuyama H. and Murakawa K. , J. Electrochem. Soc., 126, 1979, 1, 1881

Tada T. , J. Electrochem. Soc., 128, 1981, 8, 1791

Krikuchi M. , Sugawara S. , Murase K. and Matsuyama K. , J. Electrochem. Soc., 124, 1977, 1648

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Tada T. , J. Electrochem. Soc., 126, 1979, 9, 1635

Pittman C.U. , Ueda M. , Chen C.Y. , Kwiatkowski J.H. , Cook C.F. , Helbert J.N. , J. Electrochem. Soc., 128, 1981, 8, 1758

Lai J.H. , Helbert J.N. , Cook C.F. , Pittman C.U. , J. Vac. Sci. Technol, 16, 1979, 1992

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Tada T. , J. Electrochem.Soc., 1126, 1979, 11, 1829

Helbert J.N. , Cook C.F. , Chen C.Y. , Pittman C.V. , J. Electrochem. Soc., 126, 1979, 4, 695

Heller I. , Feder R. , Hatzakis M. , Spiller E. , J. Electrochem. Soc., 126, 1979, 154

Moreau W. , Merritt D. , Mayer W. , Hatzakis M. , J. Vac. Sci. Technol, 16, 1979, 6, 1989

Hatano Y. , Shiraishi H. , Taniguchi Y. , Horigome S. , Nongaki S. , Naraoka K. , Proc 8th Intl. Conf. on ‘Electron and Ion Beam Sci. and Technol’, Bakish R , Ed, Electron Soc., Princeton 332, 1978

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Stillwagon L. , Doerries E.M. , Thompson L.F. , Bowden M.J. , ACS Dir. Org. Coatings and Plast. Chem, Preprints, 37, 1977, 2, 38

Gipstein E. , Moreau W. , Needl O. , J. Electrochem. Soc., 123, 1976, 7, 1105

Nonogaki S. , Proc. Reg. Tech. Conf. on ‘Photopolymers, Principles Processes and Materials’, Mid Hudson Section SPE, Ellenville, New York, Oct. 13-15 1982, 1

Sacki H. , Kohda M. , Proc. 17th Symp. on ‘Semiconductor and Integrated Circuit Technology’, Tokyo, 1979, 48

Lai J.H. , Kwaitkowski J.H. , Cook C.F. , J. Electrochem. Soc., 129, 1982, 7, 1596

Lai J.H. , Shepherd L.T. , Proc. 10th Intl. Symp. on ‘Electron and Ion Beam Sci. and Technol’, 83-2, 1983, 185

Taniguchi Y. , Hatano Y. , Shiraishi H. , Horigome S. , Nonogaki S. , Naraoka K. , Japan, J. Appl. Phys, 28, 1979, 1143

Thompson L.F. , Ballantyne J.P. , Feit E.D. , J. Vac. Sci. Technol, 12, 1975, 6, 1280

Thompson L.F. , Yau L.D. , Doerries E.M. , J. Electrochem. Soc., 126, 1979, 6, 1703

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Shiraishi H. , Taniguchi Y. , Horigome S. , Nanogaki S. , Proc. Reg. Tech. Conf. on ‘Photopolymers, Principles Processes and Materials’, Mid Hudson Section SPE, Ellenville, New York, Oct. 10-12 1979, 56

Tau Z.C. , Petropoulos C.C. , Rauner F.J. , J. Vac. Sci. Technol, 19, 1981, 4, 1348

Yoneda Y. , Kitamura K. , Naito J. , Kitakohji T. , Okuyama H. , Murakawa K. , Proc. Reg. Tech. Conf. on ‘Photophysics: Principles Processes and Materials’, Mid Hudson Section SPE, Ellenville, New York, Oct. 10-12 1979, 44

Choong H.S. , Kahn F.J. , J. Vac. Sci. Techn, 19, 1981, 4, 1121

Sugegawa K. , Sugawara S. , Japan J. Appl. Phys, 20, 1981, L583

Kugegawa K. , Tamamura T. , S. Sugawara Proc. 10th Intl. Symp. on ‘Electron and Ion Beam Sci. and Technol, 83-2, 1983, 193