Characterization of Particle Motion for Polishing and Texturing under AC Field by Using Particle Dispersion Type ER Fluid

Abstract

The authors have already proposed a new method of polishing using particle dispersion type ER fluid. And also have applied this method for polishing micro hole in a ceramic disk. In this paper, we characterize the particle dispersion type ER fluid and particle motion suitable for polishing and texturing. We selected the type of abrasive material to be used in ER fluid based on theoretical calculation of the force exerted by an individual particle under alternative electric field. And also, we have experimentally obtained the force generated by ER fluid dispersing diamond particles of different size range, concentrations and dispersing media with different viscosity. Furthermore, we have observed the particle response using a high-speed video camera.

Get full access to this article

View all access options for this article.

References

1. Y. Akagami , S. Nishimura , Y. Ogasawara , T. Fujita , B. Jeyadevan and K. Nuri , "Polishing of Microholes Using ER Fluid Under Alternative Electric Field" Int. Conf. on ERMR'97 1997.

2. K. Nuri and K. Itoh, Japanese Patent (submitted) 1995.

3. T. Fujita et al., J. Mining and Material Processing Institute of Japan, 105(14)1989.

4. I. J. Lin , and T. B. Jones , J. of Electrostatics, 15 (1984) 53-65.