Magnetorheological finishing of silicon for nanometric surface generation: An experimental and simulation study

Abstract

Silicon mirrors are essential for guiding the X-ray beam and focusing it to a specific location. These mirrors using total internal reflection require super smooth surface finish due to small wavelength of X-ray. Magnetorheological finishing is a computer-controlled technique used in the production of high-quality optical lenses. This process utilizes polishing slurries based on magnetorheological fluids, whose viscosity changes with the change in magnetic field. In this work, polishing potential of silicon mirrors by magnetorheological finishing process is examined to achieve nanometric surface finish for X-ray applications. The individual effect of parameters such as magnetizing current, working gap, rotational speed on surface roughness is investigated, and optimized parameters are identified. To investigate the physical essence underlying magnetorheological finishing process, the molecular dynamics simulations are used. Molecular dynamics simulation is used to study the atomic-scale removal mechanism of single-crystalline silicon in magnetorheological finishing process and attention is paid to study the effect of gap between the tool and the workpiece on surface quality. The outcome is promising and the final surface roughness achieved is as low as 6.4 nm. The surface quality is analyzed in terms of arithmetic roughness, power spectral density, and image analysis of scanning electron microscopy for uniform evaluation.