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Abstract

Among the different methods of measuring the phase transformation temperature, electrical resistivity measurement is found to be an important probe in determining different phases in sputtered NiTi film. In the present investigation NiTi film deposited by DC magnetron sputtering, on Sih100i substrate from a hot target is studied. A four-point probe technique has been used to characterize the film. It is observed that there is a sharp and large change in the electrical resistivity whenever there is a phase change. This measurement is sufficiently sensitive to identify the presence of precipitates in the film. It is also observed that the transformation of austenite to rhombohedral produces a very sharp and large change in resistivity. The resistivity values obtained for martensite, austenite and rhombohedral phases agree well with those of bulk value. Results from DSC measurements are used to validate the resistivity measurements. However, the DSC measurements do not appear to be as sensitive.

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References

Busch, J.D. and Johnson, A.D. 1990. “Shape Memory Properties in Ni-Ti Sputter-deposited Film,” J. Appl. Phys., 68: 6224–6228 .

Busch, J.D., Mitchell, H.B. and Johnson, A.D. 1992. “Phase Transformations in Sputtered Ni-Ti Film: Effect of Heat Treatment and Precipitation,” Mat. Res. Soc. Symp. Proc., 230: 91–96 .

Collen, Kathleen R., Ellis, Arthur B., Busch, J.D. and Johnson, A.D. 1992. “Structural and Electrical Properties of Titanium Nickel Films Deposited onto Silicon Substrates,” Mat. Res. Soc. Symp. Proc., 230: 97–102 .

Fu, Yongqing and Du, Hejun 2003. “Effects of Film Composition and Annealing on Residual Stress Evolution for Shape Memory TiNi Film,” Materials Science and Engineering A, 342: 236–244 .

Ho Ken, K. and Carman, G.P. 2000. “Sputter Deposition of NiTi Thin Film Shape Memory Alloy Using a Hearted Target,” Thin Solid Films, 370: 18–29 .

Isalgue, A., Torra, V., Seguin, J.L., Bendahan, M., Amigo, J.M. and Esteve-Cano, V. 1999. “Shape Memory NiTi Thin Films Deposited at Low Temperature,” Materials Science and Engineering A., 273: 717–721 .

Lehnert, T., Crevoiseart, S. and Gotthardt, H. 2002. “Transformation Properties and Microstructure of Sputter-deposited Ni-Ti Shape Memory Alloy Thin Films,” J. Materials Science, 37: 1523–1533 .

Moberly, Warren J., Busch, J.D., Johnson, A.D. and Berkson, M.H. 1992. “In situ HVEM of Crystallization of Amorphous TiNi Thin Films,” Mat. Res. Soc. Symp. Proc., 230: 85–90 .

Miyazaki, S. and Ishida, A. 1999. “Martensitic Transformation and Shape Memory Behavior in Sputter-deposited TiNi-base Thin Films,” Materials Science Engineering A., 273: 106–133 .

10.

Seguin, J.L., Bendahan, M., Isalgue, A., Estev-Cano, V., Carchano, H. and Torra, V. 1999. “Low Temperature Crystallised Ti-rich NiTi Shape Memory Alloy Films for Microactuators,” Sensors and Actuators, 74: 65–69 .

11.

Surbled, Patric, Clerc, Catherine, Pioufle, Bruno Le, Ataka, Manabu and Fujita Hiroyuki, 2001. “Effect of the Composition and Thermal Annealing on the Transformation Temperatures of Sputtered TiNi Shape Memory Alloy Thin Films,” Thin Solid Films, 401: 52–59 .

12.

Yang, Y.Q., Jia, H.S., Zhang, Z.F., Shen, H.M., Hu, A. and Wang, Y.N. 1995. “Transformations in Sputter-deposited Thin Films of NiTi Shape Memory Alloy,” Materials Letters, 22: 137–140 .

Electrical Characterization of NiTi Film on Silicon Substrate

Abstract

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