Polyhedral oligomeric silsesquioxane (POSS) was grafted onto the surface of carbon fibres (CFs) to fabricate carbon fibre/epoxy (CF/EP) composites with improved interlaminar shear strength (ILSS) and atomic oxygen (AO) erosion resistance. POSS-CF was prepared by reacting amine groups on the pretreated CF surface with the POSS to form a continuous uniform layer of siloxane oligomers. X-Ray photoelectron spectroscopy, scanning electron microscopy and Fourier transform infrared spectroscopy demonstrated that POSS was successfully grafted onto the CF surface. The ILSS and AO erosion resistance of the POSS-treated CFs and CF-EP interface were improved because a SiO2 passivation layer formed with AO exposure, especially with POSS-EP0409. This is an effective solution for enhancing the interfacial bonding force and interfacial AO erosion resistance for the low-Earth orbit environment.
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