Abstract
Photoelastic techniques were used to evaluate an assortment of materials to determine stress trajectories in fabrics, embedded fabrics, and embedding media. Photoelastic compounds were evaluated and molds, pressure injector-molding apparatus, a method of measuring stiffness, and a polariscope were developed. Photoelastic color change of monofilament yarns in fabrics, due to stress, was found to be related to fiber thickness and the Michel-Levy scale of birefringence. A method was discovered for evaluating the condition of clamping devices with respect to stress distribution in the specimen tested.
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