Silk has weak bacteriostatic and ultraviolet (UV) resistance properties. To improve this property, in this work, Si4N3@Ag composite nanomaterials were synthesized. Subsequently, they were used to modify the surface of silk fabrics with the assistance of silane coupling agent KH792; this modification treatment not only enhanced the bacteriostatic and UV-resistant properties of the silk fabrics, but also endowed them with unique photothermal properties. Under near-infrared irradiation, at a wavelength of 808 nm and an irradiation power of 0.134 W/cm2, the temperature of the Si4N3@Ag silk fabric rapidly increased from a room temperature of 29.9°C to 61.1°C in only 45 s. Moreover, its photothermal efficiency remained essentially unchanged after a number of cycles. The results of antibacterial experiments further showed that the fabric had significant antibacterial effects against common bacteria, such as Escherichia coli and Staphylococcus aureus, and that its antibacterial performance remained significant even after a number of washes. In addition, thermogravimetric analysis showed that the introduction of Si4N3@Ag nanoparticles helped to improve the thermal stability of the silk fabric. Meanwhile, UV transmittance results showed that the Si4N3@Ag silk fabrics possessed good UV resistance. Finally, biocompatibility experiments confirmed that the Si4N3@Ag silk fabric has good biocompatibility, ensuring its safety and reliability in applications. In this work, a silk fabric with several functionalities was developed: it is excellent in photothermal conversion, antimicrobial, thermal stability, and UV resistance, and has good biocompatibility, and is expected to be widely used in many fields.
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