Abstract
Abstract
UV/Fenton process was employed to remove clopyralid; meanwhile, various UV-based oxidation processes were compared, such as UV irradiation, UV/H2O2, and UV/Fe(II). Results illustrated that UV/Fenton exhibited the highest degradation rate, and UV irradiation alone hardly affected degradation of clopyralid. Rate constants, T1/2 (half-time) and EEO (electrical energy per order) were calculated to evaluate degradation rate and energy consumption among all these approaches. Some influencing factors, such as pH, irradiation time, and molar concentration ratio of hydrogen peroxide to ferrous ions, were studied to obtain an optimal degradation condition for UV/Fenton process. To evaluate the efficiency of UV/Fenton process applied for clopyralid degradation in aqueous solution, change of chemical oxygen demand in solution after UV/Fenton treatment was measured. Ion chromatograph was used to analyze formation of inorganic ions and short-chain carboxylic acids during photodegradation process. It was found that concentrations of chloride and ammonium were increased with irradiation time, and some short-chain carboxylic acids were detected.
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