Positive-working photosensitive polyimide precursor based on polyisoimide using nifedipine as a dissolution inhibitor

Abstract

A positive-working photosensitive polyimide precursor based on polyisoimide (PFII) and nifedipine (1,4-dihydro-2,6-dimethyl-4-(nitrophenyl)-3,5-pyridinedicarboxylic acid dimethylester) (DHP) as a photosensitive compound has been developed. P11 was prepared by the ring-opening polyaddition of oxydiphthalic anhydride (ODPA) and 3,3' diamino diphenylsulphone (3,3'-DDS), followed by the treatment of trifluoroacetic anhydridetriethylamine in N-methyl-2-pyrrolidone (NMP). PII film showed excellent transparency at 365 nm and 436 nm. The dissolution behaviour of PII film containing 20 wt% of DHP after exposure and post-exposure bake (PEB) has been studied. It was found that the dissolution rate of the exposed area was about six times faster than that of the unexposed area due to the photochemical reaction of DHP in P11 film. The photosensitive polyimide precursor containing 20 wt% of DHP showed a sensitivity of 45 mJ cm- 2 and a contrast of 2.4 with 365 nm light when post-baked at 150C for 10 min and developed with cyclohexanone at 50C.

Get full access to this article

View all access options for this article.

References

[1] Rubner R , Ahne H , Kuhn E and Koloddieg G 1979 Photogr. Sci. Eng. 23 303-303

[2] Yoda N and Hiramoto H 1984 J. Macromol. Sci., Chem. A 21 1641-1641

[3] Mochizuki A , Teranishi T and Ueda M 1994 Polym. J. 26 315-315

[4] Omote T and Yamaoca T 1992 Polym. Eng. Sci. 32 1634-1634

[5] St Clair A K , St Clair T L and Shevket K I 1984 Polym. Mater. Sci. Eng. 51 62-62

[6] (a) Kanegafuti Chemical Industry Co. Ltd 1989 Japan Kokai tokkyo koho J P 89 165622-165622; 1990 Chem. Abstr. 112 57040y (b) Kanegafuti Chemical Industry Co. Ltd 1989 Japan Kokai tokkyu koho J P 89 165623; 1990 Chem. Abstr. 112 57041z (c) Chisso Corp. 1990 Japan Kokai tokkyo koho J P 90 294330, I990 Chem. Abstr. 116 42762u (d) Nippon Telegraph and Telephone Corp. 1991 Japan Kokai tokkyo koho J P 91 126779; Chem. Abstr. 115 234226y

[7] Berson J A and Brown E 1955 J. Am. Chem. Soc. 77 447-447

[8] Yamaoka T , Watanabe H , Koseki K and Asano T 1990 J. Imaging Sci. 34 50-50

[9] Ranz E 1974 Japan Kokai tokkyo koho J P 74 60733-60733; 1974 Chem. Abstr. 81 56670h

10.

[10] Leulschner R , Ahne H , Marquardt U , Nickel U , Schmidt E , Sebald M and Sezi R 1993 Microelectron. Eng. 21 255-255